Photoresist composition including polyalkylmethacrylate co-polym

Details Photoresist composition including polyalkylmethacrylate co-polym Photoresist composition including polyalkylmethacrylate co-polym

1995-03-29

1996-10-01

Clark, W. Robinson H.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525148, 525227, 525241, 525502, 525508, C08L 6110, C08L 3312, C08L 2504

Patent

active

055611940

ABSTRACT:
A polyalkylmethacrylate co-polymer of polyhydroxystyrene has been found to be an ideal blending partner in a novolak photoresist composition. The preferred co-polymer is poly(p-hydroxystyrene)-co-(methyl methacrylate). The co-polymer is fully miscible with novolaks and has a high thermal stability (>150.degree. C.).

REFERENCES:
patent: 4097283 (1978-06-01), Asano et al.
patent: 4237216 (1980-12-01), Skarvinko
patent: 4684599 (1987-08-01), DoMinh et al.
patent: 4696886 (1987-09-01), Hanabata et al.
patent: 4920028 (1990-04-01), Lazarus et al.
patent: 4980264 (1990-12-01), Chiong et al.
patent: 5153102 (1992-10-01), Lee et al.
patent: 5256521 (1993-10-01), Jayaraman
patent: 5275911 (1994-01-01), Toukhy
patent: 5275921 (1994-01-01), Koizumi et al.
patent: 5374693 (1994-12-01), Lynch et al.

Affiliated with

Also associated with

Rating

Photoresist composition including polyalkylmethacrylate co-polym does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoresist composition including polyalkylmethacrylate co-polym, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist composition including polyalkylmethacrylate co-polym will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1502463