Photoresist composition for imaging thick films

Details Photoresist composition for imaging thick films Photoresist composition for imaging thick films

2007-08-14

2007-08-14

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S192000, C430S193000, C430S270100, C430S326000, C430S919000, C430S921000, C430S926000

Reexamination Certificate

active

11179364

ABSTRACT:
The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.

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