Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1985-09-17
1987-03-31
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430286, 430270, 430519, 430191, 430196, 522 26, 522 62, 522126, 522 75, G03C 152, G03C 171, C08C 1900
Patent
active
046542922
ABSTRACT:
A photoresist composition comprising a conjugated diene polymer or its cyclized product, a photocuring agent soluble in an organic solvent and a pyrazole compound having a skeleton represented by the following formula. ##STR1## Also provided is a method of forming a photoresist pattern using the aforesaid composition.
REFERENCES:
patent: 4311773 (1982-01-01), Kaneko et al.
patent: 4349619 (1982-09-01), Kamoshida et al.
patent: 4522694 (1985-06-01), Schaefer
Fujino Katsuhiro
Ogawa Satoshi
Oie Masayuki
Sugimoto Sadao
Yamazaki Masahiro
Fujitsu Limited
Hamilton Cynthia
Kittle John E.
Nippon Zeon Co. Ltd.
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