Photoresist composition containing a novel polymer

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430192, 430193, 430326, 430330, G03F 7023, G03F 730

Patent

active

061034436

ABSTRACT:
A photoresist composition comprising a film forming resin obtained by condensing a phenol derivative and a substituted diphenyl ether, a photoactive compound, and a solvent. The photoresist composition may also contain an alkali-soluble, film-forming resin, such as a novolak resin. The photoresist of the instant invention improves the photospeed, resolution and thermal stability of the photoresist images.

REFERENCES:
patent: 3869292 (1975-03-01), Peters
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4717640 (1988-01-01), Stahlhofen
Light Sensitive Systems, Chapter 7.4, 1965, J. Kosar.
Chemistry & Application of PhenolicResins, Chapter 4, 1979, A. Knop, W. Scheib.

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