Photoresist composition containing 4,6-(bis)chloromethyl-5-triaz

Details Photoresist composition containing 4,6-(bis)chloromethyl-5-triaz Photoresist composition containing 4,6-(bis)chloromethyl-5-triaz

1996-05-20

1997-09-16

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430171, G03F 7021

Patent

active

056679300

ABSTRACT:
A photopolymerization photoresist composition having a binder resin, a multifunctional compound, a photopolymerization initiator, a sensitizer and other additives. The photopolymerization initiator has one or more 4,6-bis(chloromethyl)-s-triazine compound containing a diazophenyl group. The initiator acts as a chromophore and is represented by the following general formula I: ##STR1## wherein the position at which the diazo group bonds to phenyl group may be changed. R is an aliphatic radical or an unsubstituted- or substituted aromatic radical and n is an integer of 0 to 2.

REFERENCES:
patent: 4189323 (1980-02-01), Bahr
patent: 4772534 (1988-09-01), Kawamura et al.
patent: 5064741 (1991-11-01), Koike et al.
patent: 5130224 (1992-07-01), Kawabe et al.

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