Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1986-11-17
1988-11-29
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430166, 430167, 430197, 430270, 430271, 430272, 430312, 430313, 430323, G03C 160, G03C 1727
Patent
active
047881275
ABSTRACT:
A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasma etch.
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Reichmanis et al., "Approaches to Resist for Two-Level RIE Pattern Transfer Applications," Solid State Technology, Aug. 1985, pp. 130-135.
Bailey David B.
Feldman Michael M.
Bowers Jr. Charles L.
Davis William J.
Eastman Kodak Company
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