Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-08-03
1997-07-15
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, 4302812, 4302881, G03F 7023, G03F 7028
Patent
active
056481942
ABSTRACT:
A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition.
REFERENCES:
patent: 5364738 (1994-11-01), Kondo et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5527656 (1996-06-01), Imai et al.
Hawkins Robert E.
Pai Daniel Y.
Chu John S. Y.
Goldberg Robert L.
Shipley Company L.L.C.
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