Photoresist composition comprising a quinone diazide sulfonate o

Details Photoresist composition comprising a quinone diazide sulfonate o Photoresist composition comprising a quinone diazide sulfonate o

1991-04-30

1994-01-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 430165, 430326, G03F 7023, G03F 732

Patent

active

052799182

ABSTRACT:
A photoresist composition useful for the preparation of semiconductors and to be irradiated by light with a wavelength of from 330 to 450 nm, which comprises (1) an alkali-soluble resin, (2) a quinone-diazide type photosensitive compound and (3) a solvent, wherein

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Patent Abstracts of Japan vol. 11, No. 181 (P-585) (2628) Jun. 11, 1987, & JP-A-62 010646 (Kanto Kagaku K.K.) Jan. 19, 1987, *the whole document*.

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