Photoresist composition and method of exposing photoresist

Details Photoresist composition and method of exposing photoresist Photoresist composition and method of exposing photoresist

1992-10-26

1997-07-01

Dott, Janis L.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430327, 430395, 430494, 430944, G03C 500, G03F 726

Patent

active

056437005

ABSTRACT:
A satisfactory resist pattern can be formed, by focusing detection at a high accuracy, from a photoresist containing an infrared absorption dye and by an exposure method of determining focusing by an infrared light and using a photoresist containing the infrared absorption dye as the photoresist, whereby the focusing detection system is free from the effect of the secondary reflection or the like, that is, the focusing detection system is free from the effect of light transmitted or reflected in the substrate, whether the substrate is infrared light reflecting or permeating.

REFERENCES:
patent: 4822718 (1989-04-01), Latham et al.
patent: 4997745 (1991-03-01), Kawamura et al.
patent: 5147758 (1992-09-01), Smothers et al.
Grant & Hackh's Chemical Dictionary, 5th Edition, Roger Grant & Claire Grant, eds. (1987) NY: McGraw-Hill pp. 166 & 434.
A. J. Gordon & R. Ford The Chemist's Companion; New York (1972) pp. 180-181 .

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