Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-04-01
1998-06-02
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, G03F 7023
Patent
active
057597367
ABSTRACT:
A photoresist composition comprising an alkali-soluble resin (A) and a radiation sensitive compound (B), as main components, which further contains a compound (C) of the following formula (I): ##STR1## wherein each of R.sup.1 to R.sup.4 which are independent of one another, is a hydrophobic substituent or a hydrogen atom, provided that all of R.sup.1 to R.sup.4 are not simultaneously hydrogen atoms, and each of a to d which are independent of one another, is an integer of from 1 to 5, and when any one of R.sup.1 to R.sup.4 is present in a plurality, the plurality of such any one of R.sup.1 to R.sup.4 may be the same or different.
REFERENCES:
patent: 5366843 (1994-11-01), Jeffries, III et al.
patent: 5376497 (1994-12-01), Kawata et al.
Chemical Abstracts, vol. 120, No. 24, Jun. 13, 1994, and JP 05 323 598, Dec. 7, 1993.
Kawase Yasuhiro
Kusumoto Tadashi
Nakano Koji
Nishi Mineo
Chu John S.
Mitsubishi Chemical Corporation
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