Photoresist composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430191, 430192, 430193, G03F 7023

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active

057597367

ABSTRACT:
A photoresist composition comprising an alkali-soluble resin (A) and a radiation sensitive compound (B), as main components, which further contains a compound (C) of the following formula (I): ##STR1## wherein each of R.sup.1 to R.sup.4 which are independent of one another, is a hydrophobic substituent or a hydrogen atom, provided that all of R.sup.1 to R.sup.4 are not simultaneously hydrogen atoms, and each of a to d which are independent of one another, is an integer of from 1 to 5, and when any one of R.sup.1 to R.sup.4 is present in a plurality, the plurality of such any one of R.sup.1 to R.sup.4 may be the same or different.

REFERENCES:
patent: 5366843 (1994-11-01), Jeffries, III et al.
patent: 5376497 (1994-12-01), Kawata et al.
Chemical Abstracts, vol. 120, No. 24, Jun. 13, 1994, and JP 05 323 598, Dec. 7, 1993.

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