Photoresist composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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Details

430286, 430522, 430926, 430927, G03C 500, G03C 184, G03C 158, G03C 168

Patent

active

044079273

ABSTRACT:
By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene homopolymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution can be obtained even when a base board having a surface of a high reflectance is used, with a high reproducibility and without being affected by prebaking conditions.

REFERENCES:
patent: 4290870 (1981-09-01), Kondoh et al.
patent: 4349619 (1982-09-01), Kamoshida et al.

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