Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-06-03
1983-10-04
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430286, 430522, 430926, 430927, G03C 500, G03C 184, G03C 158, G03C 168
Patent
active
044079273
ABSTRACT:
By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene homopolymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution can be obtained even when a base board having a surface of a high reflectance is used, with a high reproducibility and without being affected by prebaking conditions.
REFERENCES:
patent: 4290870 (1981-09-01), Kondoh et al.
patent: 4349619 (1982-09-01), Kamoshida et al.
Harada Kunihiro
Harita Yoshiyuki
Kamoshida Yoichi
Yoshihara Toshiaki
Hamilton Cynthia
Japan Synthetic Rubber Co. Ltd.
Kittle John E.
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