Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1984-10-22
1986-03-11
Brown, J. Travis
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 430311, 430510, G03C 152
Patent
active
045754802
ABSTRACT:
A positive photoresist composition in the form of solution which comprises a resin soluble in an aqueous alkaline solution, a 1,2-quinonediazide derivative as a photosensitizer, and at least one anti-halation agent in amounts of about 1 to about 10 parts by weight in relation to 100 parts by weight of the resin in the composition, the anti-halation agent being selected from the group consisting of dyestuffs of specific structures.
REFERENCES:
patent: 4349619 (1982-09-01), Kamoshida et al.
patent: 4356254 (1982-10-01), Takahashi et al.
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4414314 (1983-11-01), Kaplan et al.
Horiuchi Yoshiaki
Kamata Yoichi
Kotani Takeshi
Brown J. Travis
Nagase Kasei Kogyo Kabushiki Kaisha
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