Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-09-10
1982-09-14
Downey, Mary F.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430270, 430281, 430286, 430311, 430927, G03C 170, G03C 171
Patent
active
043496199
ABSTRACT:
By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene polymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution and only a small number of pinholes can be obtained even when a base board having a surface of a high reflectance is used.
REFERENCES:
patent: 3711287 (1973-01-01), Dunham et al.
patent: 3948667 (1976-04-01), Ichikawa et al.
patent: 4268603 (1981-05-01), Sato
patent: 4287289 (1981-09-01), Sato
Harada Kunihiro
Harita Yoshiyuki
Kamoshida Yoichi
Yoshihara Toshiaki
Downey Mary F.
Japan Synthetic Rubber Co. Ltd.
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