Photoresist coating method and apparatus

Details Photoresist coating method and apparatus Photoresist coating method and apparatus

1998-03-25

2000-09-12

Bell, Janyce

Coating processes

Centrifugal force utilized

118 52, 427362, 4273855, 437231, B05D 312

Patent

active

061174866

ABSTRACT:
A resist coating method for forming a resist film on a substrate by supplying a resist solution to substantially a center of a substrate surface while the substrate is rotated, rotating the substrate at a low speed by decelerating the rotation of the substrate after the supply of the resist solution is terminated, and rotating the substrate at a high speed by accelerating the rotation of the substrate after the substrate is rotated at the low speed for a predetermined time-period.

REFERENCES:
patent: 4267212 (1981-05-01), Sakawaki
patent: 5405813 (1995-04-01), Rodrigues
patent: 5498449 (1996-03-01), Bae
patent: 5658615 (1997-08-01), Hasebe et al.
patent: 5773082 (1998-06-01), Ku et al.
Derwent Abstract, AN 97-070585, JP 8-316120, Nov. 29, 1996.

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