Coating processes – Centrifugal force utilized
Reexamination Certificate
2011-01-11
2011-01-11
Jolley, Kirsten C (Department: 1715)
Coating processes
Centrifugal force utilized
C118S052000, C118S603000, C118S610000, C438S782000
Reexamination Certificate
active
07867559
ABSTRACT:
This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparatus using such a photoresist coating liquid supplying apparatus, which can realize coating without causing significant defects in a cost-effective manner.The photoresist coating liquid supplying apparatus comprises a buffer vessel for a photoresist coating liquid, a circulation filtering apparatus for drawing a part of the coating liquid from the buffer vessel, filtering the coating liquid, and then returning the filtered coating liquid to the buffer vessel, and a pipe for supplying the coating liquid from the buffer vessel or the circulation apparatus to a coating apparatus. The photoresist coating liquid supplying method uses the photoresist coating liquid supplying apparatus. The photoresist coating apparatus comprises a combination of the coating liquid supplying apparatus with a slit coating apparatus.
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English Language Abstract of JP 1-278727 A.
Kojima Kazuhiro
Noya Atsuko
Taniguchi Katsuto
AZ Electronic Materials USA Corp.
Jain Sangya
Jolley Kirsten C
Kass Alan P.
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