Photoresist coating failure sensing methods and detection...

Details Photoresist coating failure sensing methods and detection... Photoresist coating failure sensing methods and detection...

2004-06-24

2009-12-29

Hill, Jr., Robert J (Department: 1797)

Chemical apparatus and process disinfecting, deodorizing, preser

Analyzer, structured indicator, or manipulative laboratory...

Means for analyzing liquid or solid sample

C073S001060, C073S001260, C073S031040, C438S014000

Reexamination Certificate

active

07638096

ABSTRACT:
Methods and devices for detecting photoresist coating failures are disclosed. A disclosed method to detect a photoresist coating failure on a semiconductor wafer comprises: loading a photoresist coated wafer on a notch position check block; rotating the coated wafer; detecting the position of a notch in the wafer; blowing air toward the surface of the wafer with at least one air nozzle located over the rotating wafer; detecting an amount of the air blown from the at least one air nozzle; and generating a coating failure signal if a variation in the amount of air blown from the at least one air nozzle is indicative of a photoresist coating failure.

REFERENCES:
patent: 3729966 (1973-05-01), Khoury et al.
patent: 4607525 (1986-08-01), Turner et al.
patent: 5233203 (1993-08-01), Haga
patent: 5939130 (1999-08-01), Shiraishi et al.
patent: 6522385 (2003-02-01), Ahn et al.

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