Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
Reexamination Certificate
2007-03-30
2010-06-15
Lindsay, Jr., Walter L (Department: 2812)
Semiconductor device manufacturing: process
With measuring or testing
Optical characteristic sensed
C118S679000
Reexamination Certificate
active
07736918
ABSTRACT:
Provided are a photoresist coating apparatus and a method of coating photoresist using the same. The apparatus includes a photoresist supply line through which photoresist is supplied. A fluid control valve is connected to the photoresist supply line to control the flow of the photoresist. A nozzle assembly is connected to the photoresist supply line at a rear end of the fluid control valve. The nozzle assembly includes a nozzle located above the center of a semiconductor wafer loaded in a photoresist coating unit to spray the photoresist. A camera is located outside the photoresist coating unit to monitor the shape or spraying amount of the nozzle located at the tip of the nozzle assembly. A controller converts data monitored by the camera into an electric signal and processes the electric signal.
REFERENCES:
patent: 6391111 (2002-05-01), Fujimoto et al.
patent: 2003/0047136 (2003-03-01), Yang
patent: 1020000013343 (2000-03-01), None
International Search Report and Written Opinion for PCT/KR2007/001571 dated Jul. 16, 2007.
Kwon Young-Jong
Seo Young-Joon
Greenlee Winner and Sullivan P.C.
Lindsay, Jr. Walter L
Nanofa Co., Ltd.
Patel Reema
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