Photoresist coating apparatus

Details Photoresist coating apparatus Photoresist coating apparatus

1996-02-21

1998-02-24

Czaja, Donald E.

Coating apparatus

Projection or spray type

Rotating turret work support

118321, 118 52, 118315, 239557, B05B 1302

Patent

active

057208140

ABSTRACT:
A supporting plate is disposed above a rotating stage to drive rotatively a semiconductor wafer mounted thereon, and a nozzle fitting rotating disk is secured to the supporting plate rotatively. The rotating center of the nozzle fitting rotating disk is disposed at a position eccentric from a central axis line of the rotating stage. At least one nozzle group in rows composed of a plurality of nozzles for ejecting a photoresist on the semiconductor wafer is fitted to the nozzle fitting rotating disk at intervals in a radial direction of the disk. At least one fitting position of the plurality of nozzles composing nozzle groups is adjustable.

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