Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Diazo-type process – i.e. – producing dye image by reacting...
Patent
1989-08-02
1993-08-31
Bowers, Jr., Charles J.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Diazo-type process, i.e., producing dye image by reacting...
430141, 430176, 430311, 430312, 430326, 430327, 430328, G03C 518, G03F 112, G03F 700
Patent
active
052408078
ABSTRACT:
A water soluble built-on mask layer is provided on a photoresist composition disposed on a substrate. The photoresist comprises an o-quinone diazide and a novolak or paravinyl phenol resin. The built-on mask layer comprises a water soluble, photobleachable diazonium salt, a coupler for the diazonium salt and an acidic, polymeric, film forming resin such as polystyrene sulfonic acid.
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Emmi Salvatore
Jain Sangya
Phillips Thomas S.
Bowers, Jr. Charles J.
Hoechst Celanese Corporation
Roberts Richard S.
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