Photoresist applying device and applying method therefor

Coating apparatus – Projection or spray type

Reexamination Certificate

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Details

C118S052000, C118S612000

Reexamination Certificate

active

07018472

ABSTRACT:
A photoresist applying device of the present invention is provided with an air-bubble collecting part on a photoresist flow passage at its predetermined part of a nozzle pipe directly connected to a nozzle tip. As a result, there is no possibility of ejection at the nozzle tip onto a substrate simultaneously with ejection of photoresist.

REFERENCES:
patent: 2002/0124798 (2002-09-01), Kitano et al.
patent: 09206584 (1997-08-01), None

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