Photoresist and method for forming a relief image utilizing comp

Details Photoresist and method for forming a relief image utilizing comp Photoresist and method for forming a relief image utilizing comp

1992-02-06

1993-05-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 430270, 430272, 430325, 430326, 430330, 430905, 430909, G03F 7023, G03F 730

Patent

active

052100006

ABSTRACT:
A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.

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patent: 4678737 (1987-07-01), Schneller et al.
patent: 4720445 (1988-01-01), Brahim et al.
patent: 4857435 (1989-08-01), Hopf et al.

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