Photoreceptor fabrication method

Etching a substrate: processes – Forming or treating optical article

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

216 37, 216102, C23F 136

Patent

active

060511486

ABSTRACT:
A photoreceptor fabrication method involving a photoreceptor substrate having a metal surface, comprising etching the metal surface of the photoreceptor substrate with an etching solution and forming a metal oxide layer on the metal surface with the etching solution, wherein the etching of the metal surface and the forming of the metal oxide layer are conducted in the absence of an electric current.

REFERENCES:
patent: 3907650 (1975-09-01), Pinsler
patent: 4076564 (1978-02-01), Fisher
patent: 4134763 (1979-01-01), Fujimura et al.
patent: 4559279 (1985-12-01), Honjo et al.
patent: 4618552 (1986-10-01), Tanaka et al.
patent: 4741918 (1988-05-01), Nagy de Nagybaczon et al.
patent: 4904557 (1990-02-01), Kubo
patent: 5051328 (1991-09-01), Andrews et al.
patent: 5096792 (1992-03-01), Simpson et al.
patent: 5188916 (1993-02-01), Hodumi et al.
patent: 5219691 (1993-06-01), Fukuda et al.
patent: 5252422 (1993-10-01), Okano et al.
patent: 5429715 (1995-07-01), Thomas et al.
patent: 5573445 (1996-11-01), Rasmussen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photoreceptor fabrication method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoreceptor fabrication method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoreceptor fabrication method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2333935

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.