Photoprotective/cosmetic compositions comprising cinnamonitrile-

Details Photoprotective/cosmetic compositions comprising cinnamonitrile- Photoprotective/cosmetic compositions comprising cinnamonitrile-

1995-11-17

1998-10-27

Glass, Margaret W.

Drug, bio-affecting and body treating compositions

Topical sun or radiation screening, or tanning preparations

Aromatic acid or derivative containing

424 47, 424 7012, 528 41, 528 43, 556416, 556417, 556415, C07F 708

Patent

active

058275096

ABSTRACT:
Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel cinnamonitrile-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent cinnamonitrile radical which comprises an alkylene or alkyleneoxy bridging group, which is bonded directly to a silicon atom, and which has the formula (4): ##STR2##

REFERENCES:
patent: 4178303 (1979-12-01), Lorenz et al.
patent: 4307240 (1981-12-01), Ching
patent: 4562278 (1985-12-01), Hill
patent: 4804531 (1989-02-01), Grollier
patent: 5136065 (1992-08-01), Yeh
patent: 5306485 (1994-04-01), Robinson et al.
Journal of Organometallic Chemistry, vol. 285, 1985, pp. 375-381, Fitzmaurice, N. J. et al, "The Stereochemistry of Organometallic Compounds". XXXVI. Regio- and Stereo-Chemical Control in the Nickel-Catalysed Hydrocyanation of Silylalkynes.

Affiliated with

Also associated with

Rating

Photoprotective/cosmetic compositions comprising cinnamonitrile- does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoprotective/cosmetic compositions comprising cinnamonitrile-, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoprotective/cosmetic compositions comprising cinnamonitrile- will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1611976