Coating apparatus – With vacuum or fluid pressure chamber – With means to apply electrical and/or radiant energy to work...
Patent
1985-12-20
1987-05-12
Newsome, John H.
Coating apparatus
With vacuum or fluid pressure chamber
With means to apply electrical and/or radiant energy to work...
118620, 427 531, C23C 1400
Patent
active
046640576
ABSTRACT:
A photoprocessing apparatus for processing substrates includes a chamber for holding the substrates and a light source for providing an electromagnetic beam along an axis. A substantially conical reflector is positioned along the axis of the electromagnetic beam to reflect the electromagnetic beam as a plane of light into the chamber. The substrates are arranged in the chamber with respect to the plane of light reflected by the substantially conical reflector, by being either substantially parallel to or substantially normal to the plane of light. If the substrates are substantially parallel to the plane of light and the chamber is filled with a reaction gas, photo-deposition will occur when the plane of light irradiates the reaction gas adjacent to a substrate, so that a film is deposited on the substrate. Other photoprocessing techniques such as photo-etching can be performed when the substrates are arranged normal to the plane of light.
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patent: 4427723 (1984-01-01), Swain
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patent: 4581248 (1986-04-01), Roche
Allied Corporation
Lamb Bruce L.
Newsome John H.
Trepp Robert M.
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