Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Forming nonplanar image
Patent
1983-08-25
1987-04-14
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Forming nonplanar image
430327, 430325, 430311, 430260, 430396, 430271, 430277, G03C 174, G03C 516, G03C 1112, G03C 900
Patent
active
046578390
ABSTRACT:
Improved resolution in a low cost non-critical photopolymer printing process is achieved by a non-volatile liquid image quality photopolymer layer disposed with air free surfaces sandwiched between two carrier surfaces, one being transparent and carrying a transparency image in contact with the liquid photopolymer to be exposed by radiation to cure the layer and produce the image pattern. In a typical example, paste-consistency photopolymer is imaged onto printed wiring boards by coating the board overall and positioning the photographic film over the board in register and off-contact. A resilient blade is pressed against the phototool at one end of the board and drawn across the surface, thus forcing the photographic film into intimate contact with the photopolymer and purging all air therebetween. Mounted on the resilient blade aft of leading edge is a shuttered tubular lamp which hardens the photopolymer where the photographic film is clear, so that in a single pass the photographic film is sequentially mated and photopolymer exposed, to produce line widths unmatched by competing dry film systems and at speeds of 0.5 feet per second. Film thicknesses from 0.006 mm to 0.05 mm can give resolutions for line widths and spacings as fine as 0.076 mm.
REFERENCES:
patent: 2760863 (1956-08-01), Plambeck
patent: 3629036 (1971-12-01), Isaacson
patent: 3837887 (1974-09-01), Akamatsu et al.
patent: 3848998 (1974-11-01), Yonekura et al.
patent: 4002478 (1977-01-01), Kokawa et al.
patent: 4052603 (1977-10-01), Karlson
patent: 4070110 (1978-01-01), Ott
patent: 4087182 (1978-05-01), Aiba et al.
patent: 4127436 (1978-11-01), Friel
patent: 4230793 (1980-10-01), Losert et al.
patent: 4260675 (1981-04-01), Sullivan
patent: 4268602 (1981-05-01), Yoshino et al.
patent: 4291118 (1981-09-01), Boduch et al.
Ewald Fred Noemer, The Handbook of Modern Halftone Photography with Complete Concepts and Practices, 6th ed., Perfect-Graphic-Arts Supply Company, Demarest, N.J., 1975, pp. 1-2,5,30-31.
J. Gasper and J. J. DePalma, "Optical Properties of the Photographic Emulsion", Chapter 20 of The Theory of the Photographic Process (4th ed.), T. H. James, ed., Macmillan Publishing Co., Inc., New York, N.Y., 1977, p. 601.
W. S. DeForest, Photoresist Materials and Processes, McGraw-Hill Book Company, New York, N.Y., 1975, p. 119.
Thomas A. Richter and George B. Collins, "Comparing UV Exposure Systems for PCBs: Contact, Off-Contact and Projection Systems", Circuits Manufacturing, vol. 19, No. 11, 1979, pp. 69, 117-119.
M. D. Palmer, Photomask Protection by Oleophobic Films", IBM Disclosure Bulletin, vol. 16, No. 7, p. 2319, Dec. 1973.
Brown Laurence R.
Hamilton Cynthia H.
Kittle John E.
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