Photopolymerized acrylic polymer essentially devoid of residual

Details Photopolymerized acrylic polymer essentially devoid of residual Photopolymerized acrylic polymer essentially devoid of residual

1980-04-04

1981-12-22

Hamrock, William F.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415923, 525344, 528487, C08L 3300, C08L 3302, C08F 246, C08F 400

Patent

active

043069550

ABSTRACT:
The thin rubbery layer resulting from the photopolymerization of a thin layer of an aqueous solution of acrylic monomer(s) is face surface coated with a coating of an alkali metal sulfite and/or metabisulfite, and is then shredded, dried and ground to provide acrylic polymer/copolymer from which virtually all residual monomer has been depleted and which is well suited for use as a polymeric flocculant.

REFERENCES:
patent: 2960486 (1960-11-01), Pye
patent: 3755280 (1973-08-01), Saunders
patent: 3780006 (1973-12-01), Zweigle
patent: 4178221 (1979-12-01), Boutin et al.
patent: 4187363 (1980-02-01), Marshall et al.

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