Photopolymerizable resins

Details Photopolymerizable resins Photopolymerizable resins

1982-06-30

1983-07-12

Phynes, Lucille M.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415922, 427 44, 528 96, 528117, 528367, C08F 800, C08F 246

Patent

active

043929303

ABSTRACT:
Diacrylates or dimethacrylates, which are compatible with water before exposure to actinic radiation but after such exposure form hard, insoluble, coatings which are resistant to organic solvents and to water, are made by reaction with (meth)acrylic acid, or with a dicarboxylic acid and a hydroxy group-containing (meth)acrylate, of epoxide groups in an advanced diepoxide resin containing groups of formula ##STR1## where R.sup.4 denotes a divalent (cyclo)aliphatic or araliphatic radical,

REFERENCES:
patent: 4012565 (1977-03-01), Freedman et al.
patent: 4084020 (1978-04-01), Mathias et al.
patent: 4150166 (1979-04-01), Mathias et al.
patent: 4150167 (1979-04-01), Mathias
patent: 4167465 (1979-09-01), Zussman et al.
patent: 4306954 (1981-12-01), Wendling et al.

Affiliated with

Also associated with

Rating

Photopolymerizable resins does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable resins, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable resins will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-197453