Photopolymerizable mixtures and processes for the photopolymeriz

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

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528 89, 528 91, 528 92, 20415911, C08F 250, C08J 328, C08G 5968, C08G 5972

Patent

active

045607095

ABSTRACT:
Cationically polymerizable compounds, for example epoxide compounds, can be polymerized photochemically using a catalyst combination consisting of an aromatic iodonium salt and a ketone of the formula I, II or III ##STR1## in which n is 1 or 2 and Ar, X, X', R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1. In this combination, the ketones act as a co-catalyst and drastically accelerate the photopolymerization, although they are not able to initiate a cationic photopolymerization on their own.

REFERENCES:
patent: 3708296 (1973-01-01), Schlessinger
patent: 4026705 (1977-05-01), Crivello
patent: 4156035 (1979-05-01), Tsao et al.
patent: 4156046 (1979-05-01), Lien et al.
patent: 4193799 (1980-03-01), Crivello
patent: 4219377 (1980-08-01), Albrecht
patent: 4250203 (1981-02-01), Schlessinger et al.
patent: 4284485 (1981-08-01), Berner
patent: 4321118 (1982-03-01), Felder et al.
patent: 4336366 (1982-06-01), Berner et al.
patent: 4351708 (1982-09-01), Berner et al.
patent: 4428807 (1984-01-01), Lee et al.
F. A. M. Abdul-Rasoul et al, Polymer, 1978, 1219.

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