Photopolymerizable element comprising a soluble or dispersible o

Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Element

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430263, 430271, 430273, 430258, G03C 190, G03C 500, G03C 178, G03C 196

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active

043605826

ABSTRACT:
A photopolymerizable element comprising a layer of a photopolymerizable composition and a liquid developer-soluble or -dispersible transparent oriented film support laminated onto one surface of the photopolymerizable composition layer is advantageously employed for the production of a polymeric image without stripping of the film support. The element may further comprise a strippable protective film provided on the other surface of the photopolymerizable composition layer. The element of this invention is useful especially for the production of photoresists which are advantageously used for the manufacture of printed circuit boards.

REFERENCES:
patent: 2760863 (1956-08-01), Plambeck
patent: 3895949 (1975-07-01), Akamatsu et al.
patent: 4126466 (1978-11-01), Roos
patent: 4301230 (1981-11-01), Taguchi et al.

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