Photopolymerizable diepoxides containing a nitrogen heterocycle

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544296, 544300, 544302, 544310, 528393, 528117, 548308, 548318, 542436, 544314, 544316, 544318, C07D40514

Patent

active

041247604

ABSTRACT:
Diepoxides which may be photopolymerized in the presence or absence of a photosensitizer contain a group having conjugated unsaturation attached to a nitrogen heterocycle, such as a hydantoin or barbituric acid residue, forming part of an advanced diepoxide. The resultant photopolymer may be crosslinked by heating in the presence of a curing agent for epoxide resins.
The diepoxides are of use in the production of printing plates and printed circuits, especially multilayer printed circuits.

REFERENCES:
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patent: 3843675 (1974-10-01), Porret et al.
patent: 3846442 (1974-11-01), Habermeier et al.
patent: 3852302 (1974-12-01), Habermeier et al.
patent: 3864357 (1975-02-01), Porret et al.
patent: 3948916 (1976-04-01), Porret et al.

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