Photopolymerizable composition for formed-in-place artificial na

Details Photopolymerizable composition for formed-in-place artificial na Photopolymerizable composition for formed-in-place artificial na

1975-09-15

1977-11-15

Tillman, Murray

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415913, 20415915, 20415916, 260879, 260880B, 424 61, 427 2, 427 4, 427 44, 427 53, 427 54, C08L 132, C08F 246, C08F 800

Patent

active

040584429

ABSTRACT:
Photopolymerizable composition of matter for the production of formed-in-place artificial nails.

REFERENCES:
patent: 3709866 (1973-01-01), Waller
patent: 3756827 (1973-09-01), Chang
patent: 3809569 (1974-05-01), Aronoff et al.
patent: 3862021 (1975-01-01), Hagihara et al.
patent: 3883453 (1975-05-01), Takahashi et al.
patent: 3896014 (1975-07-01), Rosenberg
patent: 3912670 (1975-10-01), Huemmer et al.
patent: 3927203 (1975-12-01), Seymour et al.
patent: 3950238 (1976-04-01), Eldred
patent: 3996394 (1976-12-01), Harris
patent: 3998712 (1976-12-01), Hickmann et al.

Affiliated with

Also associated with

Rating

Photopolymerizable composition for formed-in-place artificial na does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable composition for formed-in-place artificial na, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable composition for formed-in-place artificial na will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1718795