Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1982-09-23
1984-03-20
Marquis, Melvyn I.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
528 92, C08F 250, C08G 5968
Patent
active
044379595
ABSTRACT:
A photopolymerizable composition based on an epoxy compound contains as a curing catalyst a combination of an .alpha.-ketosilyl compound with an aluminum compound having at least one organic radical directly bonded to the aluminum atom, and further contains as a photosensitizer a benzophenone compound and/or a thioxanthone compound.
REFERENCES:
patent: 2634282 (1953-04-01), Sommer
patent: 2775605 (1956-12-01), De Benneville et al.
patent: 3489781 (1970-01-01), Wilkus
patent: 3708296 (1973-01-01), Schlesinger
patent: 4009128 (1977-02-01), Vanderberg
patent: 4081276 (1978-03-01), Crivello
patent: 4086091 (1978-04-01), Cella
patent: 4297458 (1981-10-01), Stark
patent: 4322513 (1982-03-01), Wada et al.
patent: 4324873 (1982-04-01), Wada et al.
patent: 4335367 (1982-06-01), Mitsui et al.
Brook et al.; Journal Amer. Chem. Soc. 85, No. 6, Mar. 1963, pp. 832-833.
Brook et al.; Canadian Journal of Chem. 41, No. 9, Sep. 1963, pp. 2351-2356.
Brook et al.; Canadian Journal of Chem. 42, No. 1, Jan. 1964, pp. 298-304.
Brook et al.; Canadian Journal of Chem. 49, No. 19, May 1971, pp. 1622-1628.
J. V. Crivello et al., "Photoinitiated Cationic Polymerization by Dialkylphenacylsulfonium Salts," J. of Polymer Science, vol. 17, p. 2877, (1979).
A. G. Brook et al., "The Spectral and Chemical Properties of .alpha.-Silyl Ketones," J. Am. Chem. Soc., vol. 82, p. 5102, (1960), [A. G. Brook, J. Am. Chem. Soc., 91, 355, (1969)].
H. Bock et al., "d-Orbital Effects in Silicon-Substituted .pi.-Electron Systems. XV. The Color of Silyl Ketones," J. Am. Chem. Soc., 91:2, 355, (1969).
Chemical Abstracts, vol. 83, No. 20, Nov. 17, 1975), Columbus, Ohio, United States, T. Takeuchi, "Photo-Curable Resin Coating Compositions", p. 103, Abstract No. 165970c & JP-A-75-50441.
Hayase Shuzi
Suzuki Shuichi
Koeckert A. H.
Marquis Melvyn I.
Tokyo Shibaura Denki Kabushiki Kaisha
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