Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-08-30
1993-10-05
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430285, 430287, 430281, 430284, 522 31, 522 32, G03F 7008, G03F 7029
Patent
active
052503852
ABSTRACT:
A photopolymerizable composition comprises a photopolymerizable ethylenically unsaturated compound having at least two terminal ethylene groups, a photopolymerization initiator and an organic polymer binder, wherein the photopolymerization initiator is an aromatic sulfonic acid salt of an onium compound. The composition has high sensitivity to actinic rays over a wide range of wavelength extending from ultraviolet to visible region and thus can be used for preparing a lithographic printing plate, a resin-letterpress plate, a resist or photomask for making a printed board, a monochromatic and colored sheet for transfer or color-development and a color-developing sheet.
REFERENCES:
patent: 4069054 (1978-01-01), Smith
patent: 4108747 (1978-08-01), Crivello
patent: 4245029 (1981-01-01), Crivello
patent: 4423136 (1983-12-01), Crivello et al.
patent: 4659649 (1987-04-01), Dickinson et al.
patent: 4954416 (1990-09-01), Wright et al.
Aotani Yoshimasa
Kondo Syun-ichi
Umehara Akira
Yamaoka Tsuguo
Fuji Photo Film Co. , Ltd.
Hamilton Cynthia
LandOfFree
Photopolymerizable composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photopolymerizable composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1002818