Photopolymer photoresist composition containing rosin tackifier

Details Photopolymer photoresist composition containing rosin tackifier Photopolymer photoresist composition containing rosin tackifier

1977-11-02

1980-04-08

Welsh, John D.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Element

430907, 430913, 430632, 430524, 430306, G03G 168

Patent

active

041971329

ABSTRACT:
In a photoresist material comprising a support having formed thereon a layer of a photopolymerizable composition comprising a film forming polymer, a monomer having at least one addition polymerizable unsaturated bond, and a photopolymerization initiator, the adhesive property and the light-sensitivity of the layer of the photopolymerizable composition are improved by incorporating a rosin tackifier in the layer.

REFERENCES:
patent: 2211689 (1940-08-01), Dittmar
patent: 2485248 (1949-10-01), Watson
patent: 2760863 (1956-08-01), Plambeck, Jr.
patent: 3615106 (1971-10-01), Flanagan et al.
patent: 3650754 (1972-03-01), Jones
patent: 3713831 (1973-01-01), Hayes et al.

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