Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Element
Patent
1977-11-02
1980-04-08
Welsh, John D.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Element
430907, 430913, 430632, 430524, 430306, G03G 168
Patent
active
041971329
ABSTRACT:
In a photoresist material comprising a support having formed thereon a layer of a photopolymerizable composition comprising a film forming polymer, a monomer having at least one addition polymerizable unsaturated bond, and a photopolymerization initiator, the adhesive property and the light-sensitivity of the layer of the photopolymerizable composition are improved by incorporating a rosin tackifier in the layer.
REFERENCES:
patent: 2211689 (1940-08-01), Dittmar
patent: 2485248 (1949-10-01), Watson
patent: 2760863 (1956-08-01), Plambeck, Jr.
patent: 3615106 (1971-10-01), Flanagan et al.
patent: 3650754 (1972-03-01), Jones
patent: 3713831 (1973-01-01), Hayes et al.
Hasegawa Eiichi
Yazawa Kenichiro
Fuji Photo Film Co. , Ltd.
Welsh John D.
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