Photopatterned product of silicone polyamic acid on a transparen

Details Photopatterned product of silicone polyamic acid on a transparen Photopatterned product of silicone polyamic acid on a transparen

1988-08-08

1989-08-08

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430 14, 430 17, 430272, 430326, 156628, G03C 300

Patent

active

048551996

ABSTRACT:
Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyimide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.

REFERENCES:
patent: 3886865 (1975-06-01), Ohto et al.
patent: 4381396 (1983-04-01), Ryang
patent: 4410612 (1983-10-01), Goff et al.
patent: 4454220 (1984-06-01), Goff
patent: 4510227 (1985-04-01), Mohr
patent: 4600685 (1986-07-01), Hitakohf et al.
patent: 4782009 (1988-11-01), Bolon et al.

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