Photopatternable polyimide compositions and method for making

Details Photopatternable polyimide compositions and method for making Photopatternable polyimide compositions and method for making

1984-07-09

1986-03-25

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430282, 430283, 430284, 430325, 430327, 430330, 430927, 430272, 430270, G03C 516, G03C 170, G03C 176

Patent

active

045783284

ABSTRACT:
There is provided an article of manufacture prepared by

REFERENCES:
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patent: 3325450 (1967-06-01), Holub
patent: 3553282 (1971-01-01), Holub
patent: 3622321 (1971-11-01), Smets et al.
patent: 3902902 (1975-09-01), Kleeburg et al.
patent: 4030948 (1977-06-01), Berger
patent: 4266005 (1981-05-01), Nakamura et al.
patent: 4410612 (1983-10-01), Goff et al.
W. S. DeForest, Photoresist, McGraw-Hill Book Company, 1975, New York, N.Y., pp. 89-109.
T. F. Saunders et al., "Photosensitive Polyimide Coatings", IBM Technical Disclosure Bulletin, vol. 16, No. 2, Jul. 1973, pp. 601-602.
R. Rubner et al., "Production of Highly Heat-Resistant Film Patterns from Photoreactive Polymeric Precursors, Part 2, Polyimide Film Patterns", Siemens Forschiu, Entwickl. Ber. Bd. 5, 1976, No. 4, pp. 235-239.

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