Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate
2007-07-06
2009-10-27
Olsen, Allan (Department: 1792)
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
C216S052000
Reexamination Certificate
active
07608194
ABSTRACT:
Photonic crystal structures are made by a method including steps of providing a substrate, depositing at least one planar layer to form a stack, each planar layer of the stack comprising two or more sublayers having different sublayer refractive indices, depositing a hard mask material, depositing an imprintable material over the hard mask material, patterning the imprintable material by imprinting an array of depressions, and directionally etching at the depressions a regular array of openings through the hard mask material and the stack.
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Champion David
Coulman Donald J.
Cruz-Uribe Tony S.
Peters Kevin
Stasiak James
Hewlett--Packard Development Company, L.P.
Olsen Allan
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