Photon sieve for optical systems in micro-lithography

Details Photon sieve for optical systems in micro-lithography Photon sieve for optical systems in micro-lithography

2008-05-06

2008-05-06

Wells, Nikita (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S365000, C250S492200, C250S492220, C378S034000, C378S035000

Reexamination Certificate

active

11356324

ABSTRACT:
The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffractive element for EUV.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 6894292 (2005-05-01), Gil et al.
patent: 7160673 (2007-01-01), Menon et al.
patent: 98/33096 (1998-07-01), None
patent: 98/38597 (1998-09-01), None

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