Photon-enhanced neutral beam etcher and cleaner

Details Photon-enhanced neutral beam etcher and cleaner Photon-enhanced neutral beam etcher and cleaner

1997-05-22

1999-04-27

Mayekar, Kishor

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

156345, B01J 1908

Patent

active

058978445

ABSTRACT:
An apparatus for processing substrates, the apparatus including a plurality of molecular dissociation furnaces. Each dissociation furnace produces a directed beam of neutral dissociated reactive species. Each reactive beam is directed at a surface of the semiconductor substrate. A photon source is also directed at the surface of the semiconductor substrate. The intensity and wavelength of the photon source are selected to enhance the reaction rate over that of the reactive beam acting alone on the surface.

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patent: 5284544 (1994-02-01), Mizutani et al.
"New Molecular-dissociation furnace for H and O atom sources" by Bert Van Zyl and M.W. Gealy, Nov. 10, 1985, Review of Scientific Instruments 57 (3) .

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