Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2006-02-22
2008-09-16
Prenty, Mark (Department: 2822)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S070000
Reexamination Certificate
active
07425461
ABSTRACT:
A pixel cell having a substrate, photo-conversion device, and at least one dielectric layer over the photo-conversion device. The at least one dielectric layer includes one or more rare earth elements for amplifying the number of photons capable of being converted to charge by the photo-conversion device.
REFERENCES:
patent: 6624925 (2003-09-01), Hasson et al.
patent: 7145189 (2006-12-01), Mouli
patent: 2003/0063204 (2003-04-01), Suda
Chen, B. R. et al.—“Optoelectronic property of PN junction on erbium-doped silicon using thermal diffusion method,” Solid State Electronics 47 (2003) pp. 2127-2130.
Tang, Y.S. et al.—“Characteristics of rare-earth element erbium implanted in silicon,” Appl. Phys. Lett. 55 (5), Jul. 31, 1989, pp. 432-433.
Dickstein & Shapiro LLP
Micro)n Technology, Inc.
Prenty Mark
LandOfFree
Photon amplification for image sensors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photon amplification for image sensors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photon amplification for image sensors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3977771