Photon absorbing surfaces and methods for producing the same

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126901, 428615, 428687, 156634, 156656, 156657, 427283, F24J 302

Patent

active

042090083

ABSTRACT:
Photon absorbing surfaces which are effective over a broad band of photon energies are described. These surfaces consist of a two-phase material with a protruding second phase whose dimensions are on the order of microns. Photons are absorbed by multiple reflections within the region of the protruding phase. The surfaces are produced by directional solidification of eutectic compositions to produce aligned second phase microstructures within a metallic matrix. The matrix material is then selectively removed to expose the second phase material.

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patent: 4086264 (1978-04-01), Brooks et al.
patent: 4148294 (1979-04-01), Scherber et al.

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