Photomasks with antistatic control

Stock material or miscellaneous articles – Structurally defined web or sheet – Discontinuous or differential coating – impregnation or bond

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428539, B05D 512

Patent

active

039491315

ABSTRACT:
In high resolution lithography, resolution impairment sometimes occurs due to dust collecting on the mask. The dust is often attracted to the mask by static electricity. The solution proposed is to coat the entire photomask with a transparent, electrically conductive coating. The coating is electrically grounded to drain static charge. Conductive materials are often used for lithographic masks, but the patterns cannot be grounded effectively because there are island regions in the pattern.
If the pattern is itself conducting, there is the added option of applying the antistatic layer under the pattern.
If the pattern is formed of a photographic emulsion of a patterned photoresist, it is protected from damage and wear in handling by the harder conductive coating.

REFERENCES:
patent: 2887412 (1959-05-01), Thomas
patent: 2894858 (1959-07-01), Lytle
patent: 3210214 (1965-10-01), Smith
patent: 3443915 (1969-05-01), Wood et al.
patent: 3681227 (1972-08-01), Szupillo
patent: 3686028 (1972-08-01), O'Keeffe
patent: 3801418 (1974-04-01), Cornelis et al.
Fraser et al., Highly Conductive, Transparent Films of Sputtered In.sub.2.sub.-x Sn.sub.x O.sub.3.sub.-y. In J. Electrochem. Soc.: Solid-State Science and Technology, 119(10): pp. 1368-1374, Oct. 1972.

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