Photomasks

Details Photomasks Photomasks

2004-12-29

2009-10-20

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07604905

ABSTRACT:
Photomasks are disclosed. A disclosed example photomask comprises: a first pattern located along an axis of the photomask; at least one second pattern located a distance from and a predetermined angle to the first pattern; and slits made of Cr on at least one end of each of the first and second patterns, wherein the photomask is a Cr-less mask.

REFERENCES:
patent: 5858580 (1999-01-01), Wang et al.
patent: 5989756 (1999-11-01), Nakae
patent: 6406818 (2002-06-01), Zemen et al.
patent: 6828068 (2004-12-01), Progler et al.
patent: 10-2002-0090487 (2002-12-01), None
patent: WO 03/054626 (2003-07-01), None

Affiliated with

Also associated with

Rating

Photomasks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomasks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomasks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4062226