Photomasking composition, process for preparing same and mask ob

Details Photomasking composition, process for preparing same and mask ob Photomasking composition, process for preparing same and mask ob

1980-03-06

1981-05-19

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430270, 430296, 430326, 20415922, 526245, 426292, G03C 168

Patent

active

042685907

ABSTRACT:
The invention relates to resins used for manufacturing or reproducing masks in electronics.
The photomasking composition corresponds to the general formula: ##STR1## in which R.sub.1, R.sub.1 ', R.sub.1 ", R.sub.2, R.sub.2 ', R.sub.2 " designate alkyl radicals whose principal chain contains from 1 to 10 carbon atoms, the symbols F, Cl and Br which designate the fluorine, chlorine and the bromine bearing indices a, b, c, a', b', and c' representing the number of these atoms which are zero or positive whole numbers, such as m, n, p.

REFERENCES:
patent: 3779806 (1973-12-01), Gipstein et al.
patent: 3931435 (1976-01-01), Gipstein et al.
patent: 3934057 (1976-01-01), Moreau et al.
patent: 4051271 (1977-09-01), Fujishige
patent: 4061832 (1977-12-01), Roberts
patent: 4087569 (1978-05-01), Hatzakis
patent: 4156745 (1979-05-01), Hatzakis et al.

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