Photomask with reduced electrostatic discharge defects

Details Photomask with reduced electrostatic discharge defects Photomask with reduced electrostatic discharge defects

2004-08-24

2008-09-02

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07419748

ABSTRACT:
A photomask and a method for forming a photomask are disclosed in which the photomask pattern is modified to bridge features that are likely to produce electrostatic discharge related defects. In one embodiment those adjacent features that are closely spaced together and have a high surface area differential, are bridged using a bridge that has a width less than the minimum optical resolution of the photolithography process.

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patent: 6660540 (2003-12-01), Englisch
patent: 6734443 (2004-05-01), Zheng
patent: 6861179 (2005-03-01), Hsieh et al.
patent: 2004/0229129 (2004-11-01), Allen et al.

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