Photomask with phase shifter and method of fabricating semicondu

Details Photomask with phase shifter and method of fabricating semicondu Photomask with phase shifter and method of fabricating semicondu

1991-10-09

1993-09-28

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430319, G03F 900

Patent

active

052485757

ABSTRACT:
A photomask has a light shielding layer and a phase shifter based on a phase shift method, both of which are mounted on a mask substrate. The light shielding layer is shaped in a light shielding pattern, having light passing regions beside its opposite sides. The phase shifter is made by thinning the mask substrate at a portion associated with one of the light passing regions. An optical path through the phase shifter is shorter than the optical path of the other light passing region, thereby shifting the phase of light.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto

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