Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1993-11-04
1995-03-14
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 428421, 428422, 428522, 428524, G03F 900
Patent
active
053976657
ABSTRACT:
A photomask with pellicle which is treated so that even if the obverse and reverse surfaces of the photomask are stained with a trace amount of contaminative particles during cleaning, water content and a low-volatile component are prevented from adhering to such contaminative particles during storage, thereby preventing the photomask from becoming stained with passage of time. Also disclosed is a method of treating and storing the photomask. The photomask is subjected to a hydrophobic treatment by providing the obverse and reverse surfaces thereof with a trimethylsilyl film formed by a reaction of OH groups in these surfaces with 1,1,1,3,3,3-hexamethyldisilazane. Even if contaminative particles are attached to the obverse and reverse surfaces of the photomask in a trace amount during cleaning, no water content or low-volatile component will adhere to such contaminative particles during storage and/or transport of the photomask with a pellicle attached thereto, so that the photomask is prevented from becoming stained with passage of time. Accordingly, the photomask with pellicle can be stably stored for a long period of time and also stably transported, and it can be used any number of times for a long period of time.
REFERENCES:
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patent: 5008362 (1991-04-01), Wilharm et al.
World Patents Index Latest, Week 8934 JA(A) 1-179946 (abstract).
Patent Abstracts of Japan, vol. 9, No. 163 (P-371), Jul. 9, 1985 JP(A) 60-39651 (abstract).
World Patents Index Latest, Week 8648 JP (A) 61-231545 (abstract).
Patent Abstracts of Japan, vol. 13, No. 213 (E-759) May 18, 1989 JP (A) 1-25535 (abstract).
Inomata Hiroyuki
Tabuchi Kazuhiro
Yamauchi Takashi
Dai Nippon Printing Co. Ltd.
Rosasco S.
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