Photomask used in fabrication of mask read only memory

Details Photomask used in fabrication of mask read only memory Photomask used in fabrication of mask read only memory

1999-01-11

2000-10-31

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061399922

ABSTRACT:
A photomask used in a formation of a mask read only memory (mask ROM) device is provided. The photomask contains a bonding pad opening pattern and a code area opening pattern so that bonding pads and code areas are simultaneously formed in a more economical operation.

REFERENCES:
patent: 5989783 (1999-11-01), Huggins et al.

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