Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-07-03
2009-02-17
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07491475
ABSTRACT:
It is to provide a photomask substrate which has a low birefringence and with which polarized illumination can be employed or immersion exposure can be carried out.A photomask substrate made of a synthetic quartz glass to be used for production of a semiconductor employing a light source having an exposure wavelength of at most about 200 nm, which has a birefringence of at most 1 nm/6.35 mm at the exposure wavelength, and of which the amount of decrease in light transmittance is at most 1.0% as a difference in light transmittance at a wavelength of 217 nm, between before and after irradiation with Xe excimer lamp with an illuminance of 13.2 mW/cm2for 20 minutes.
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U.S. Appl. No. 11/836,304, filed Aug. 9, 2007, Kikugawa et al.
Hino Keigo
Kikugawa Shinya
Mishiro Hitoshi
Asahi Glass Company Limited
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Rosasco Stephen
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