Photomask structure

Details Photomask structure Photomask structure

2011-04-12

2011-04-12

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S322000, C430S324000

Reexamination Certificate

active

07923175

ABSTRACT:
A photomask structure is described, including a substrate having multiple half-tone phase shift patterns on a device region and multiple opaque patterns on a die seal ring region. By using the photomask, a side lobe effect does not occur to the photoresist layer corresponding to the die seal ring region in the exposure step.

REFERENCES:
patent: 5831330 (1998-11-01), Chang
patent: 6523165 (2003-02-01), Liu et al.
patent: 6681379 (2004-01-01), Pierrat et al.
patent: 6730444 (2004-05-01), Bowes
patent: 6762000 (2004-07-01), Nozawa et al.
patent: 2002/0102473 (2002-08-01), Tange et al.
patent: 2003/0173675 (2003-09-01), Watanabe et al.
patent: 2004/0053142 (2004-03-01), Wang et al.

Affiliated with

Also associated with

Rating

Photomask structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask structure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2668407